We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Spin Cleaner.
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Spin Cleaner Product List and Ranking from 5 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Aug 27, 2025～Sep 23, 2025
This ranking is based on the number of page views on our site.

Spin Cleaner Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Aug 27, 2025～Sep 23, 2025
This ranking is based on the number of page views on our site.

  1. 島田テクノロジー Shizuoka//Industrial Machinery
  2. テクニカルフィット Saitama//Industrial Machinery
  3. フクシマ 長野本社 Nagano//Manufacturing and processing contract
  4. ソフエンジニアリング Saitama//Industrial Electrical Equipment
  5. 5 ゼビオス（XEVIOS CORP.,） Saitama//Industrial Machinery
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Spin Cleaner Product ranking

Last Updated： Aggregation Period:Aug 27, 2025～Sep 23, 2025
This ranking is based on the number of page views on our site.

  1. Spin cleaning device 島田テクノロジー
  2. Spin cleaning device フクシマ 長野本社
  3. Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)" テクニカルフィット
  4. Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)" ゼビオス（XEVIOS CORP.,）
  5. 4 Semi-Automatic SPINDip Spin Coater Device - Lift-Off and Resist Stripping ソフエンジニアリング

Spin Cleaner Product List

1～5 item / All 5 items

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Spin cleaning device

Spin cleaning device

Cleaning without the use of chemicals instead of RCA cleaning.

Our company offers a "Spin Cleaning Device" that does not require chemical solutions, eliminating the need for conventional wastewater treatment facilities of a general scale. Since there are no skin irritations such as chemical burns, the working environment is improved. Additionally, due to its high cleaning and rinsing capabilities, it is possible to reduce the amount of pure water used. 【Features】 ■ Reduction of wastewater treatment load ■ Improvement of the working environment ■ Reduction of pure water usage *For more details, please download the PDF or feel free to contact us.

  • Other cleaning machines

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Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"

Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"

One-chamber multipurpose scrub cleaning. It is possible to remove foreign substances and metal contamination in one chamber! Space-saving, making it suitable for research and development.

This is a single-chamber device that performs various sizes and types of wafers, including surfactants, pure water scrubbing, chemical spraying, megasonic spot showering, and spin drying. It is a space-saving model that allows for complete cleaning within a single cleaning layer, making it suitable for locations with limited space. Please consult us regarding single-function scrub cleaning devices. 【Features】 ■ Cleaning, rinsing, and drying can be done in one place ■ Target wafers: Silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ4”, φ6” to φ8” *For more details, please contact us or download the catalog for more information.

  • Other semiconductor manufacturing equipment

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Semi-Automatic SPINDip Spin Coater Device - Lift-Off and Resist Stripping

Semi-Automatic SPINDip Spin Coater Device - Lift-Off and Resist Stripping

Supports various sizes, board types, and device pattern conditions with the new in-house demo machine! Customizable to an optimal form.

This device is equipped with a variety of tools, including [horn-type ultrasonic], [BLT-type ultrasonic], [high-pressure jet nozzle], and [spray nozzle], to support demonstrations of organic lift-off for various substrate surface conditions. It can accommodate various sizes, substrate types, and device pattern states with an in-house demonstration machine. Furthermore, we will incorporate the insights and know-how gained to customize the implementation device into an optimal form. *For more details, please refer to the PDF materials or feel free to contact us. Wafer, batch-type cleaning equipment, substrate cleaning equipment, spin cleaning equipment, semiconductor manufacturing equipment, resist stripping equipment, megasonic, cleaning equipment, photoresist, photolithography process, silicon, batch substrate cleaning machine, batch spin cleaning machine, surface treatment, thin wafer, insulating film, high-pressure jet cleaning machine, substrate cleaning equipment, load lock chamber, glass transport, glass substrate, wafer cleaning machine.

  • Other processing machines

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Spin cleaning device

Spin cleaning device

We respond to diverse cleaning needs with high-speed clean technology!

The "Spin Cleaning Device" is a product handled by Shimada Technology Co., Ltd. It adopts an environmentally friendly cleaning method centered on "water and air." It also achieves high-efficiency exhaust through a full-circle exhaust cup structure. Additionally, it realizes high yield with a variety of cleaning tools. Furthermore, we offer handling compatible with wafer-type and rectangular substrates, as well as a wide range of unit lineups that accommodate various sizes. 【Features】 ■ Contributes to energy savings through high performance ■ Achieves high yield with a variety of cleaning tools ■ Matches various sizes and substrates *For more details, please refer to the PDF document or feel free to contact us.

  • Other cleaning machines

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Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"

Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"

One-chamber multi-purpose scrub cleaning. It is possible to remove foreign substances and metal contamination in one chamber! Space-saving, making it suitable for research and development.

This is a single-chamber device that performs various sizes and types of wafers, including surfactants, pure water scrubbing, chemical spraying, megasonic spot showering, and spin drying. It is a space-saving model that allows for complete cleaning within a single cleaning layer, making it suitable for areas with limited space. Please consult us regarding single-function scrub cleaning devices. 【Features】 ■ Cleaning, rinsing, and drying can all be done in one place ■ Target wafers: silicon, quartz, oxides, compounds, etc. ■ Compatible wafer diameters: φ2” to φ4”, φ6” to φ8” *For more details, please contact us or download the catalog for more information.

  • Other semiconductor manufacturing equipment
  • Other cleaning machines
  • Ultrasonic Cleaner

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